Collection of ENEA technology and expertise
Electric discharge in rarefied gas DPP source of EUV radiation for detector testing and calibration, spectroscopic measurements and surface treatments of innovative materials of technological interest.
Compact source of EUV radiation generated by high voltage electrical discharge (25 kV, peak current = 13 kA, half period =240 ns) in gas.
Application sectors
Problem to solve
EUV radiation, due to its photon energy (100 eV), is able to generate changes in the structure of various materials. Its short wavelength (10-20 nm), combined with its low penetration into virtually all materials (tens of nm), allows for the generation of high-resolution patterns on surfaces. EUV in the field of nuclear for medical applications is also used for the generation of lithium fluoride color centers, allowing testing and calibrating tLiF detectors. EUV also allows for the calibration of diamond detectors.
Description
The DPP source is a compact, pulsed source of EUV radiation. The operating principle is based on the generation of a radially compressed plasma column heated to a temperature of about 350000 °C. The source emits pulses of EUV radiation of 100 ns duration, in the spectral range of 10-18 nm wavelength. The energy per pulse (in band) is about 35 mJ/sr at a repetition frequency of 10 Hz. The transverse size of the source is about 300 um. The dose of EUV radiation released is measured using absolute detectors.
Innovative aspects and advantages
- Compactness respect to the other sources as Synchrotron machines.
- High pulse energy with respect to Synchrotron machines.
- User friendly with respect to Synchrotron machines
Technological Maturity 6-7
Strengths
- Cost
- Social/economic relevance
- Legal/regulatory content
- Efficiency/productivity/performance
- Innovation
- Lack of technology/solution for the specific task
- Scalability
- Ease of use
- Transferability/mobility
Admissible applications
- Calibration of EUV detectors
- Generation of defects in LiF, diamond (color centers) and graphene
- Generation of high resolution patterns on photoresist and other materials
- Test of EUV optical devices and spectrometers
Research group involved
Revision date
26-05-2025
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