Collection of ENEA technology and expertise
Atomic Layer Deposition (ALD)
Application sectors
Problem to solve
The plant aims to solve problems mainly related to the need to protect surfaces and integrity of structural materials by applying protective inorganic coatings (e.g. corrosion by aggressive liquids, erosion, electrical and/or thermal insulation, gas permeation...) Potential users are companies producing materials and components intended for applications in severe environments where it is necessary to preserve their properties and ensure specific performance.
Description
The facility consists of a deposition chamber served by two ovens that feed the reagents necessary for the surface coating synthesis on the surface, a vacuum system to establish the vacuum necessary for the process and the PC with a SW connected to the PLC system. The deposition chamber is 300x300x200 mm in size and is entirely available to house materials and components on which the coating is to be applied.
Innovative aspects and advantages
- Ease of process up-scaling
- Extremely fine control of final thickness
- Reduced amount of materials required to achieve coating
- Ubiquitous coating deposition on every surface both internal and external of the components
Admissible applications
- Protective functional coatings
Research group involved
Revision date
11-06-2025
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